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Name： What is the sputtering target |
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Simple to say, target is the high-speed charged particles bombarding the target material can be. For example: evaporation magnetron sputtering aluminum is heated evaporation coating ... and so on. Switch to a different target (such as aluminum, copper, stainless steel, titanium, nickel target, etc.), you can get a different coating (such as super-hard, wear and corrosion of the alloy film.) Target: sputtering target (purity: 99.9% -99.999%)
1. metal targets:
Ni target, Ni, Ti target, Ti, Zn target, Zn, Cr target, Cr, Mg target, Mg, Nb target, Nb, Sn target, Sn, Al target, Al, indium target, In, Fe target, Fe, Aluminum zirconium target, ZrAl, titanium aluminum target, TiAl, Zr target, Zr, Si target, AlSi, silicon target, Si, copper target Cu, tantalum target T, a, germanium target, Ge, Ag target, Ag, Co target , Co, Au target, Au, Gd target, Gd, La target, La, Y target, Y, Ce target, Ce, tungsten target, w, stainless steel target, nickel chromium target, NiCr, hafnium target, Hf, Mo target, Mo, Fe, Ni target, FeNi, tungsten target, W and so on.
2. ceramic target
ITO target, target magnesium, iron oxide target, the target silicon nitride, silicon carbide target, the target of titanium nitride, chromium oxide target, the target of zinc oxide, zinc sulfide target, silica target, the target of a silicon oxide, cerium oxide target , Zirconium dioxide target, the target of niobium pentoxide, titanium dioxide target, zirconium dioxide target,, hafnium oxide target, the target of titanium diboride, zirconium diboride target, the target of tungsten oxide, aluminum oxide target pentoxide Tantalum, niobium pentoxide target, the target of magnesium fluoride, yttrium fluoride target, the target of zinc selenide, aluminum nitride target, target silicon nitride, boron nitride target, the target of titanium nitride, silicon carbide target, niobate Lithium target, the target praseodymium titanate, barium titanate target, target lanthanum titanate, nickel oxide target, sputtering targets.
1, the sputtering and the target
With the acceleration of the ion bombardment of solid surfaces, ion exchange of momentum and solid surface atoms, so that atoms leave the solid surface solid surface and deposited on the substrate surface, a process known as sputtering. The solid is bombarded by sputtering thin film source material, known as the target.
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